ISSM2006 ISSM2006
ConInfo
Program
Regist
Speaker
Trans
Org
Sponsor
About
Home
ISSM.JP


Japanese
The evaluation result was notified to all authors who submit abstract to ISSM 2006 on June 26, 2006. In case that the author has not received any message, please contact with us at issm_2006@semiconportal.com


CALL FOR PAPERS

Thank you for your visit to ISSM 2006 website.

ISSM 2006 CFP(WORD)
ISSM 2006 CFP JAPANESE VERSION(WORD)

ISSM 2006 Abstract Template


HIGHLIGHTS

ISSM 2006 will specially feature the highlights of the advanced semiconductor manufacturing including:

Toward Process Control Maturation
Implementation from development to HVM
Tool level and Fab level integration (EES)
Incorporation of multiple process steps (PQC)

Application of Taguchi Method
Building robustness and quality into design and products at developmental stage
MTS/TS applications to predict and diagnose yield, quality and device characteristics
Optimizing balance between quality and cost

DFM - Total Optimization for 65nm and beyond
Collaboration between design and manufacturing
Inspection and metrology technique for design
Resolution Enhancement Technology (RET)
OPC, systematic defects, process window, APC

Productivity Improvement
Bottleneck equipment productivity
Improvement in both throughput and cycle time
-On-time-delivery, raw process time reduction
Queue time control
Benchmarking on productivity

Fab Extendibility/Flexibility
Reuse of buildings, production equipments and information systems across multiple technology nodes

Application Specific Semiconductor Manufacturing
Mixed Signal/Radio Frequency/Power/Automotive
Measure against Noise, High Reliability
High Voltage Tolerance, Certification, MEMS, Sensor

SiP, 3D Modules
SiP (System in Package)
Thin Wafer less than 75 um
Lead free bump, 3D packaging

Environmental and Safety Activities
Activities for WSC 2010 targets in ESH focus areas
(energy-saving, greenhouse-gases emission reduction)
Activities and precautions against earthquake and fire
Post-disaster recovery from earthquake and fire

Nanometer-Level Contamination Control
Mini-Environment/FOUP
Damage-free wet cleaning

Challenges for 450mm Fab
Overall issue for design and manufacturing
Introduction Schedule, ROI, Wafer, Equipment
Control System, Single wafer transportation
Standardization

New Business Model
Response to rapidly changing, complex business requirements
Reduced time to ramp factories and products
Global Supply Chain Management


IMPORTANT DATES

Abstract submission start
Monday, April 10, 2006
Abstract submission due
Monday, May 15, 2006
Notification of paper acceptance
Monday, June 26, 2006
Selected final papers due
Friday, August 18, 2006
Final Presentations due
Monday, September 18, 2006


Abstracts will be selected from the following areas of interest (details):

[ Page Top ]
contact Copyright(C)2006 ISSM All Rights Reserved.